Understanding industry dynamics is crucial for businesses and practitioners. It provides valuable information that helps us make informed decisions, maintain competitive advantages, and adapt to constantly changing market environments.
In the development of computer processors, there is a very interesting period in history. From 2009 to 2017, Intel released a total of 7 generations of process……
On October 16-17, Apple CEO Tim Cook showcased his trip to Sichuan, China through his personal Weibo account. Interestingly, on October 17th, the term "Huawei's sales in China have surpassed Apple" trended on Weibo's hot search list.
On October 17th local time, the U.S. Department of Commerce's Bureau of Industry and Security published an administrative action in the Federal Register, scheduled to be released on October 19th, aimed at adding 13 Chinese companies to the export control list, also known as the "Entity List".
In addition to the laboratory-scale EUV light used by NIST to analyze semiconductor components, Dr. Steve Grantham also presented a wealth of resources at NIST's Synchrotron Ultraviolet Radiation Facility (SURF III) during the working group meeting.
When charged particles move along a curved path, they emit synchrot……
In addition to the laboratory-scale EUV light used by NIST to analyze semiconductor components, Dr. Steve Grantham also presented a wealth of resources at NIST's Synchrotron Ultraviolet Radiation Facility (SURF III) during the working group meeting.
When charged particles move along a curved path, they emit synchrot……
At the working group meeting, researchers from NIST discussed three main themes related to using EUV as an analytical tool to assist the semiconductor manufacturing industry. The three methods for utilizing EUV light as an analytical technique are: (1) high harmonic generation (HHG), (2) synchrotron radiation, and (3) ……
The main process change that affects yield is edge-placement error (EPE). This occurs when unexpected nanoscale irregularities are displayed in the edges and sidewalls of photoresist patterns. These irregularities are random and colloquially referred to as line-edge roughness (LER). As device sizes continue to shrink, ……
Absolute radiometric measurement is important not only for the development of lithography processes and instrument acceptance tests but also for the quantitative understanding of EUV light generation processes. Predictive modeling of this process has lagged behind the development of EUV tools themselves. Improving mode……
NIST is currently developing an instrument for measuring SoS at higher pressures and temperatures. The SoS instrument is part of Dr. Elizabeth Rasmussen's National Research Council (NRC) postdoctoral fellowship in metal additive manufacturing. A U.S. patent on the design and operation of the instrument was submitted in……
2.1 Droplet Generator: Extreme Thermophysical Properties and Modeling The droplet generator is an important component of the EUVL scanner assembly (Figure 3)……
