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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (IX)

Updated: 2023-10-14
Views: 9299

In addition to the laboratory-scale EUV light used by NIST to analyze semiconductor components, Dr. Steve Grantham also presented a wealth of resources at NIST's Synchrotron Ultraviolet Radiation Facility (SURF III) during the working group meeting. When charged particles move along a curved path, they emit synchrot……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (VIII)

Updated: 2023-10-14
Views: 8608

In addition to the laboratory-scale EUV light used by NIST to analyze semiconductor components, Dr. Steve Grantham also presented a wealth of resources at NIST's Synchrotron Ultraviolet Radiation Facility (SURF III) during the working group meeting. When charged particles move along a curved path, they emit synchrot……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (VII)

Updated: 2023-10-14
Views: 8739

At the working group meeting, researchers from NIST discussed three main themes related to using EUV as an analytical tool to assist the semiconductor manufacturing industry. The three methods for utilizing EUV light as an analytical technique are: (1) high harmonic generation (HHG), (2) synchrotron radiation, and (3) ……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (VI)

Updated: 2023-10-14
Views: 9352

The main process change that affects yield is edge-placement error (EPE). This occurs when unexpected nanoscale irregularities are displayed in the edges and sidewalls of photoresist patterns. These irregularities are random and colloquially referred to as line-edge roughness (LER). As device sizes continue to shrink, ……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (V)

Updated: 2023-10-14
Views: 8438

Absolute radiometric measurement is important not only for the development of lithography processes and instrument acceptance tests but also for the quantitative understanding of EUV light generation processes. Predictive modeling of this process has lagged behind the development of EUV tools themselves. Improving mode……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (IV)

Updated: 2023-10-14
Views: 11037

NIST is currently developing an instrument for measuring SoS at higher pressures and temperatures. The SoS instrument is part of Dr. Elizabeth Rasmussen's National Research Council (NRC) postdoctoral fellowship in metal additive manufacturing. A U.S. patent on the design and operation of the instrument was submitted in……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (III)

Updated: 2023-10-14
Views: 9435

2.1 Droplet Generator: Extreme Thermophysical Properties and Modeling The droplet generator is an important component of the EUVL scanner assembly (Figure 3)……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (II)

Updated: 2023-10-14
Views: 8254

Overview of NIST and Chip Metrology Program

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (I)

Updated: 2023-10-14
Views: 10075

In 2022, the semiconductor market was approximately 0.6 trillion USD, and commercial analysts predict that it will double to 1.0-1.3 trillion USD by 2030. The significant growth in the semiconductor manufacturing industry can be seen in the lithography process. Lithography is a patterning process that transfers a flat ……

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Russian Chip Plan: Mass Production of 28nm Chips by 2027 and 14nm Chips by 2030

Updated: 2023-10-13
Views: 9123

Due to the war with Ukraine and the resulting global isolation and sanctions, Russia is devising a plan to revive its struggling domestic semiconductor manufac……

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Global First! China Achieves Major Breakthrough in Chip Field

Updated: 2023-10-13
Views: 8104

For the same task, the energy consumption of this chip for on-chip learning is only 3% of that of the Advanced Process-Specific Integrated Circuit (ASIC) syste……

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Song Shiqiang's interpretation of the "domestic substitution" of the electronic information industry

Updated: 2023-10-12
Views: 9914

The progress of society is promoted by one round after another technological progress (that is, the development of productive forces), which promotes the revolution of production relation and the development of social economy, and we call it "the Kondratiev Circle (the economic cyclical theory put forward by the Russia……

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