Events

Turkish Agency Visited SLKOR Headquarter

Updated: 2023-11-10
Views: 7776

On the afternoon of November 6, 2023, a group of four people from the Turkish agency PE company, including Engin and Mustafa, visited the headquarters of Shenzhen SLKOR Micro Semicon Co., Ltd., SLKOR's General Manager, Song Shiqiang, and Deputy General Manager, He Junju, welcomed the Turkish partners warmly. This was t……

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SLKOR Corporate Profile

Updated: 2023-11-08
Views: 9290

Shenzhen SLKOR Micro Semicon Co., Ltd., Headquartered in Shenzhen, Guangdong Province, China, has an elite technical team mainly from Korean Yonsei University and Chinese Tsinghua University. Driven by new materials, new processes, and new products, SLKOR has the internationally leading technologies on the SiC MOSFET a……

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Apple brings the world's first 3nm computer chip

Updated: 2023-11-03
Views: 9648

In the development of computer processors, there is a very interesting period in history. From 2009 to 2017, Intel released a total of 7 generations of process……

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Kinghelm Corporate Profile

Updated: 2023-10-31
Views: 7983

Shenzhen Kinghelm Electronics Co., Ltd. is a national high-tech enterprise and a member of the "GNSS & LBS Association of China", "China Information Industry T……

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MediaTek releases financial report for the third quarter of 2023

Updated: 2023-10-28
Views: 9885

MediaTek releases financial report for the third quarter of 2023

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Hong Kong Electronics Fair Helps SLKOR Internationalize

Updated: 2023-10-20
Views: 8175

On October 13th, as a Chinese high-tech enterprise serving the global integration of high-end semiconductor design and development, manufacturing, sales and service, Shenzhen SlkorMicro Semicon Co., Ltd. (hereinafter referred to as SLKOR) was invited to participate in the 2023 Hong Kong Electronics Fair (Autumn Editio……

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Tea party to celebrate the Mid-Autumn Festival and National Day

Updated: 2023-10-17
Views: 8898

On the afternoon of September 28, 2023, following the festive holidays of the Mid-Autumn Festival and National Day, Kinghelm (www.kinghelm.net)/Slkor (www.slkoric.com) organized a tea party to celebrate National Day and welcome the Mid-Autumn Festival. All employees of the company actively participated and enjoyed the ……

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Slkor & Kinghelm Staff Essay Contest for Mid-Autumn Festival and National Day

Updated: 2023-10-17
Views: 7588

As the cool autumn breeze drifts in and the scent of osmanthus flowers fills the air, the double holiday of Mid-Autumn Festival and National Day in 2023 has added even more festive atmosphere. Kinghelm (www.kinghelm.net) and Slkor (www.slkoric.com) have organized an internal employee essay competition for Mid-Autumn Fe……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (IX)

Updated: 2023-10-14
Views: 9090

In addition to the laboratory-scale EUV light used by NIST to analyze semiconductor components, Dr. Steve Grantham also presented a wealth of resources at NIST's Synchrotron Ultraviolet Radiation Facility (SURF III) during the working group meeting. When charged particles move along a curved path, they emit synchrot……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (VIII)

Updated: 2023-10-14
Views: 8389

In addition to the laboratory-scale EUV light used by NIST to analyze semiconductor components, Dr. Steve Grantham also presented a wealth of resources at NIST's Synchrotron Ultraviolet Radiation Facility (SURF III) during the working group meeting. When charged particles move along a curved path, they emit synchrot……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (VII)

Updated: 2023-10-14
Views: 8534

At the working group meeting, researchers from NIST discussed three main themes related to using EUV as an analytical tool to assist the semiconductor manufacturing industry. The three methods for utilizing EUV light as an analytical technique are: (1) high harmonic generation (HHG), (2) synchrotron radiation, and (3) ……

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Official report from the United States: In-depth analysis of the current situation, demand, and development of EUV lithography (VI)

Updated: 2023-10-14
Views: 9129

The main process change that affects yield is edge-placement error (EPE). This occurs when unexpected nanoscale irregularities are displayed in the edges and sidewalls of photoresist patterns. These irregularities are random and colloquially referred to as line-edge roughness (LER). As device sizes continue to shrink, ……

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