Muva nje, ithimba labacwaningi eliholwa nguSolwazi Xu Huaping ovela eMnyangweni Wezekhemikhali eNyuvesi yaseTsinghua lenze inqubekelaphambili ebonakalayo ezintweni ezisetshenziswayo zokuthwebula izithombe ze-ultraviolet (EUV). Bakha i-photoresist yenoveli esekelwe ku-polytelluoxane (PTeO), enikeza isu elisha lokuklama lezinto ezibalulekile ekukhiqizeni okuthuthukisiwe kwe-semiconductor.

Njengoba izinqubo zesekethe edidiyelwe ziqhubekela endaweni eyi-7nm nangale kwalokho, i-EUV lithography ye-wavelength engu-13.5 nm isiwubuchwepheshe obuyisisekelo obuvumela ukwenziwa kwama-chip okuthuthukile. Kodwa-ke, izici zemithombo yokukhanya ye-EUV njengokulahlekelwa kwesibonisi esiphezulu nokukhanya okuphansi kubeka izinselele ezinkulu kuma-photoresist mayelana nokusebenza kahle kokumuncwa, izindlela zokusabela, nokulawula ukukhubazeka. Abathwebuli bezithombe abavamile be-EUV bavame ukuthembela ezindleleni zokukhulisa amakhemikhali noma amaqoqo azwela insimbi ukuze athuthukise ukuzwela kodwa ngokuvamile abhekana nezinkinga ezifana nezakhiwo eziyinkimbinkimbi, ukusatshalaliswa kwezingxenye ezingalingani, ukusakazeka kalula kokusabela, kanye nokwethulwa kokukhubazeka kwe-stochastic. Ukunqamula lezi zinkinga ukuze kwakhiwe uhlelo olufanele lwe-photoresist kuyinselelo eyinhloko emkhakheni wezinto ze-EUV wamanje we-lithography. Umphakathi wezemfundo uvuma kabanzi ukuthi i-photoresist ye-EUV efanelekile kufanele ngesikhathi esisodwa ibe nezinto ezine ezibalulekile ezilandelayo: 1) Amandla okumunca aphezulu e-EUV ukuze anciphise umthamo wokuchayeka futhi athuthukise ukuzwela; 2) Ukusebenza kahle kokusetshenziswa kwamandla okuphezulu, ukuqinisekisa ukuthi amandla okukhanya aguqulwa ngempumelelo abe yizinguquko ekuncibilikeni kwempahla ye-photoresist ngaphakathi kwevolumu encane; 3) Ukufana kwe-molecular-scale ukugwema umsindo onesici obangelwa ukusatshalaliswa kwengxenye okungahleliwe nokusabalalisa; 4) Amayunithi wokwakha amancane ukuze asuse umthelela wosayizi wesici esiyisisekelo ekulungisweni kanye nokunciphisa ukuhwaqeka konqenqema lomugqa (LER). Isikhathi eside, amasistimu abalulekile ambalwa angahlangabezana nazo zone imibandela.

Iqembu locwaningo likaProfessor Xu Huaping lenze inoveli ye-EUV photoresist esekelwe ekusungulweni kwabo kwangaphambili kwe-polytelluoxane, ukwanelisa izimo zomthwebuli wezithombe oshiwo ngenhla. Kulolu cwaningo, ithimba lifake ngokuqondile i-tellurium (Te), i-high-EUV-absorption element, kumgogodla we-polymer ngamabhondi e-Te─O. I-Tellurium inesigaba esiphezulu sokumuncwa kwe-EUV phakathi kwazo zonke izakhi ngaphandle kwamagesi angenayo i-xenon (Xe), i-radon (Rn), kanye ne-radioactive element i-astatine (At). Umthamo wayo wokumunca we-EUV udlula kude lawo wezinto zesikhathi esifushane ezivame ukusetshenziswa kuma-photoresist wendabuko nezinto zensimbi ezifana ne-Zn, Zr, Hf, ne-Sn, okuthuthukisa kakhulu ukumuncwa kwe-EUV kwe-photoresist. Ngesikhathi esifanayo, amandla okuhlukanisa aphansi uma kuqhathaniswa ebhondi ye-Te─O avumela ukwehlukana kweketango eliyinhloko ekumunceni kwe-EUV, okwenza izinguquko ze-solubility futhi kuvumela ukuzwela okuphezulu kwethoni enhle. Lesi sithombe esimelana nesithombe sihlanganiswe ngokuphelele nengxenye eyodwa yamangqamuzana amancane, ahlanganisa izici ze-photoresist ekahle ngaphansi komklamo olula kakhulu, enikeza indlela ecacile nenokwenzeka yokwakha isizukulwane esilandelayo se-EUV photoresist.

I-Polytelluoxane: I-Ideal EUV Photoresist Material

Lolu cwaningo luhlinzeka ngendlela yokuklama ye-photoresist ehlanganisa i-elementi yokumuncwa okuphezulu kwe-Te, umshini wokusika amaketango amakhulu, kanye nokufana kwezinto ezibonakalayo. Kulindeleke ukuthi kugqugquzelwe ukuthuthukiswa kwezinto ze-EUV lithography zesizukulwane esilandelayo futhi kusize ekwenziweni okusha kwezobuchwepheshe kwezinqubo ezithuthukile ze-semiconductor.

Impumelelo ehlobene yanyatheliswa ku-Science Advances ngoJulayi 16th ngaphansi kwesihloko esithi "Polytelluoxane njengendlela efanelekile yokwenza i-EUV photoresist".

Mayelana SLKOR:

SLKOR, enekomkhulu e-Shenzhen, e-China, iyibhizinisi kazwelonke elithuthuka ngokushesha elithuthukayo emkhakheni we-semiconductor yamandla. Njengoba kunezikhungo ze-R&D e-Beijing nase-Suzhou, ithimba layo lezobuchwepheshe eliyinhloko lisuka eNyuvesi yaseTsinghua. Njengomsunguli we-silicon carbide (SiC) ubuchwepheshe bedivayisi yamandla, SLKORImikhiqizo isetshenziswa kakhulu ezimotweni zamandla amasha, ukukhiqiza amandla kagesi e-photovoltaic, i-IoT yezimboni, kanye nezinto zikagesi zabathengi, ihlinzeka ngezixazululo ezibalulekile ze-semiconductor kumakhasimende angaphezu kuka-10,000 emhlabeni jikelele.

Le nkampani iletha amayunithi angaphezu kwezigidi eziyizinkulungwane ezimbili ngonyaka, nama-SiC MOSFET ayo kanye nesizukulwane sesi-2 sokululama ngokushesha ama-SBD diode abeka amabhentshimakhi embonini ngesilinganiso sokusebenza kahle kanye nokuzinza okushisayo. SLKOR inamalungelo obunikazi okusungulwa angaphezu kwe-100 futhi inikeza amamodeli wemikhiqizo engu-2,000+, ngokuqhubekayo yandisa iphothifoliyo yayo ye-IP kuwo wonke amadivayisi kagesi, izinzwa, nama-IC okuphatha amandla. Izitifiketi ezihlanganisa i-ISO 9001, i-EU RoHS/REACH, nokuthobelana kwe-CP65 kukhombisa ukuzibophezela okuqinile kwenkampani ekusunguleni okusha kwezobuchwepheshe, ukukhiqiza okunciphile, kanye nentuthuko esimeme.